Product Description:
Experience the transformative power of HAUS LABS BY LADY GAGA Triclone Skin Tech Medium Coverage Foundation with Fermented Arnica. This weightless, clean foundation is formulated with fermented arnica to visibly reduce redness and irritation, while providing protection against environmental stress. With its medium coverage and natural, luminous finish, this foundation delivers long-lasting performance without compromising your skin.
The Triclone Skin Tech Foundation is made with 20+ skincare ingredients, including the powerful Fermented Arnica that helps soothe and calm the skin. The Intellizen 7 Complex™, a proprietary blend of medicinal herbs, promotes healing and provides a calming effect. The BioFerment 7 Complex™, a blend of super antioxidants, protects the skin from stress.
Applying the foundation is a breeze. Simply shake well and blend 1-2 pumps onto clean, moisturized skin using the Haus Labs Foundation Brush, fingertips, or a beauty sponge. The lightweight, serum-like texture seamlessly blurs and smooths for a natural, luminous finish that lasts all day. No slipping or caking.
This foundation is not only effective but also clean. It is vegan, gluten-free, and cruelty-free, making it suitable for all skin types. Plus, it is formulated without harmful ingredients like phthalates, formaldehyde, oxybenzone, and more. When you see the Beauty Collection seal, you can trust that this product is free from potentially harmful substances.
| Features | Specifications |
|---|---|
| Medium coverage | – Weight: 1 oz |
| Fermented Arnica reduces redness | – Vegan: Yes |
| Long-wearing | – Gluten-free: Yes |
| Hypoallergenic | – Cruelty-free: Yes |
Elevate your makeup routine with HAUS LABS BY LADY GAGA Triclone Skin Tech Medium Coverage Foundation with Fermented Arnica. Achieve a flawless complexion while nourishing and protecting your skin. Try it today and experience the power of clean beauty.
Ingredients: Aqua (Water, Eau), Diphenylsiloxy Phenyl Trimethicone, Phenyl Trimethicone, Caprylyl Methicone, Trimethylsiloxysilicate, Propylene Glycol Dibenzoate, Isododecane, Glycerin, Butylene Glycol, Methyl Trimethicone, Lauryl Polyglyceryl-3 Polydimethylsiloxyethyl Dimethicone, C13-15 Alkane, Polyglyceryl-3 Polydimethylsiloxyethyl Dimethicone, Alcohol Denat., Acrylates/Polytrimethylsiloxymethacrylate Copolymer, Polymethylsilsesquioxane, Sorbitan Sesquioleate, Disteardimonium Hectorite, 1,2-Hexanediol, Palmitoyl Tetrapeptide-10, Arnica Montana Flower Extract**, Hydrolyzed Hyaluronic Acid, Squalane, Pseudozyma Epicola/Camellia Sinensis Seed Oil Ferment Extract Filtrate, Pseudozyma Epicola/Apricot Kernel Oil/Olive Fruit Oil/Sweet Almond Oil/Sunflower Seed Oil/Licorice Root Extract Ferment Extract Filtrate, Pseudozyma Epicola/Apricot Kernel Oil/Olive Fruit Oil/Sunflower Seed Oil/Sweet Almond Oil/(Angelica Gigas/Lithospermum Erythrorhizon) Root, Solanum Lycopersicum (Tomato) Fruit Extract, Dunaliella Salina Extract, Hedychium Coronarium Root Extract, Tocopherol, Althaea Rosea Flower Extract, Taraxacum Officinale (Dandelion) Extract, Perilla Ocymoides Leaf Extract, Panax Notoginseng Extract, Glycyrrhiza Glabra (Licorice) Root Extract, Chamomilla Recutita (Matricaria) Extract, Centella Asiatica Extract, Pseudozyma Epicola/Sunflower Seed Oil Ferment Extract Filtrate, Caprylyl Glycol, Ethylhexylglycerin, Magnesium Sulfate, Polypropylsilsesquioxane, Acrylates/Dimethicone Copolymer, Triethoxycaprylylsilane, Dimethicone/Vinyl Dimethicone Crosspolymer, Aluminum Hydroxide, CI 77891 (Titanium Dioxide), CI 77491/77492/77499 (Iron Oxides). **Fermented.
Instruction: Shake well before use. Blend 1-2 pumps onto clean, moisturized skin using the Haus Labs Foundation Brush, fingertips, or a beauty sponge.
Disclaimer: Beauty Collection products are formulated without the following banned or restricted ingredients: Acrylates, Aluminum Salts, Animal Musks/Fats/Oils, Benzophenones and related compounds, Butoxyethanol, Butylated hydroxyanisole (BHA), Butylated hydroxytoluene (BHT) under 0.1%, Carbon Black or Black 2, Coal Tar, Ethanolamines, Formaldehyde and Formaldehyde Releasing Agents, Hydroquinone, Lead and Lead Acetate, Mercury + Mercury Compounds (Thimerisol), Methoxyethanol, Methyl Cellosolve, Methylchloroisothiazolinone and Methylisothiazolinone, Mineral Oil, Nanomaterials (restrictions for specific nanomaterials only), Oxybenzone, Parabens, Petrolatum and Paraffin (USP grade only), Phenoxyethanol under 1%, Phthalates, Plastic Microbeads, Polyacrylamide & Acrylamide, Resorcinol, Retinyl Palmitate, Styrene, Sulfates, Talc (no detection of asbestos), Toluene, Triclosan and Triclocarban, Undisclosed Synthetic Fragrance (under 1% and formulated without Acetaldehyde, Acetone, Acetonitrile, Benzalkonium chloride, BPA, EDTA, Methylene chloride, PTFE, PFOA), 1,4-Dioxane (ingredients must comply with impurity thresholds), Octinoxate, PFAS compounds, Nitromusks and Polycyclic Musks, Ethoxylated Ingredients (including PEGS or polyethylene glycol must meet contamination limits for 1,4-Dioxane and ethylene oxide), Cyclic Silicones, EDTA and derivatives (allowed if no technical substitute under 0.2%).
