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HAUS LABS BY LADY GAGA Triclone Skin Tech Medium Coverage Foundation with Fermented Arnica

Original price was: $104.92.Current price is: $78.69.

Weightless, clean foundation with fermented arnica. Reduces redness, protects from stress. Medium coverage for a natural, luminous finish. Vegan, gluten-free, and cruelty-free.

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SKU: 2597466P502185 Category: Brand:

Product Description:
Product Description:

Experience the transformative power of HAUS LABS BY LADY GAGA Triclone Skin Tech Medium Coverage Foundation with Fermented Arnica. This weightless, clean foundation is formulated with fermented arnica to visibly reduce redness and irritation, while protecting your skin from environmental stress. With its medium coverage, this foundation delivers a natural, luminous finish that lasts all day without slipping or caking.

Features:

  • Medium coverage foundation for a natural finish
  • Formulated with fermented arnica to reduce redness and irritation
  • Protects the skin from environmental stress
  • Weightless and serum-like texture
  • Long-wearing performance
  • Vegan, gluten-free, and cruelty-free

Specifications:

Coverage Medium
Finish Natural
Formulation Liquid
Highlighted Ingredients Fermented Arnica, Intellizen 7 Complex™
Ingredient Callouts Vegan, gluten-free, cruelty-free

Instructions:

For best results, shake the bottle well before use. Blend 1-2 pumps of the foundation onto clean, moisturized skin using the Haus Labs Foundation Brush, fingertips, or a beauty sponge. The weightless, serum-like texture seamlessly blurs and smooths for a natural, luminous finish that wears all day.

Ingredients:

Aqua (Water, Eau), Diphenylsiloxy Phenyl Trimethicone, Phenyl Trimethicone, Caprylyl Methicone, Trimethylsiloxysilicate, Propylene Glycol Dibenzoate, Isododecane, Glycerin, Butylene Glycol, Methyl Trimethicone, Lauryl Polyglyceryl-3 Polydimethylsiloxyethyl Dimethicone, C13-15 Alkane, Polyglyceryl-3 Polydimethylsiloxyethyl Dimethicone, Alcohol Denat., Acrylates/Polytrimethylsiloxymethacrylate Copolymer, Polymethylsilsesquioxane, Sorbitan Sesquioleate, Disteardimonium Hectorite, 1,2-Hexanediol, Palmitoyl Tetrapeptide-10, Arnica Montana Flower Extract**, Hydrolyzed Hyaluronic Acid, Squalane, Pseudozyma Epicola/Camellia Sinensis Seed Oil Ferment Extract Filtrate, Pseudozyma Epicola/Apricot Kernel Oil/Olive Fruit Oil/Sweet Almond Oil/Sunflower Seed Oil/Licorice Root Extract Ferment Extract Filtrate, Pseudozyma Epicola/Apricot Kernel Oil/Olive Fruit Oil/Sunflower Seed Oil/Sweet Almond Oil/(Angelica Gigas/Lithospermum Erythrorhizon) Root, Solanum Lycopersicum (Tomato) Fruit Extract, Dunaliella Salina Extract, Hedychium Coronarium Root Extract, Tocopherol, Althaea Rosea Flower Extract, Taraxacum Officinale (Dandelion) Extract, Perilla Ocymoides Leaf Extract, Panax Notoginseng Extract, Glycyrrhiza Glabra (Licorice) Root Extract, Chamomilla Recutita (Matricaria) Extract, Centella Asiatica Extract, Pseudozyma Epicola/Sunflower Seed Oil Ferment Extract Filtrate, Caprylyl Glycol, Ethylhexylglycerin, Magnesium Sulfate, Polypropylsilsesquioxane, Acrylates/Dimethicone Copolymer, Triethoxycaprylylsilane, Dimethicone/Vinyl Dimethicone Crosspolymer, Aluminum Hydroxide, CI 77891 (Titanium Dioxide), CI 77491/77492/77499 (Iron Oxides). **Fermented.

Beauty Collection:

HAUS LABS BY LADY GAGA Triclone Skin Tech Medium Coverage Foundation with Fermented Arnica is part of the Beauty Collection collection. When you see our Clean seal, you can be sure that this product is formulated without certain ingredients that are potentially harmful to human health and the environment. It is free from acrylates, aluminum salts, animal musks/fats/oils, benzophenones, butoxyethanol, formaldehyde and formaldehyde-releasing agents, hydroquinone, lead and lead acetate, mercury and mercury compounds, methoxyethanol, methyl cellosolve, methylchloroisothiazolinone and methylisothiazolinone, mineral oil, oxybenzone, parabens, petrolatum and paraffin, phenoxyethanol, phthalates, plastic microbeads, polyacrylamide and acrylamide, resorcinol, retinyl palmitate, styrene, sulfates, talc, toluene, triclosan, triclocarban, undisclosed synthetic fragrance, 1,4-dioxane, octinoxate, PFAS compounds, nitromusks and polycyclic musks, ethoxylated ingredients, cyclic silicones, and EDTA and derivatives.

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